By Oleg A. Popov

This ebook describes the layout, physics, and function of excessive density plasma assets which were commonly explored in low strain plasma processing, akin to plasma etching and planarization, plasma improved chemical vapor deposition of skinny motion pictures, sputtered deposition of metals and dielectrics, epitaxial development of silicon and GaAs, and lots of different purposes.

This is a finished survey and an in depth description of so much complex excessive density plasma assets utilized in plasma processing. The publication is a balanced presentation in that it provides either a theoretical therapy and useful purposes. it's going to be of substantial curiosity to scientists and engineers engaged on plasma resource layout, and strategy development.

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